Japan Advanced Chemicals Logo
Japanese >>
  • Home
  • Company Profile
    • Message from the President
    • Management Philosophy
    • History
    • Access
  • Products
    • JAC’s Technologies
    • The field/areas in which JAC’s precursors are used.
    • Precursors
    • Film Deposition Service
    • Stainless Steel Canister
      • Stainless Steel Canisters (small size)
      • Stainless Steel Canister (Large size)
      • Stainless Steel Canister (UN Certified Canister)
      • Feature of JAC’s Canister
    • Consulting service
    • Custom Services (Entrusted Business)
    • Original Technology Development （R&D）
  • Photo Gallery
  • CSR activities
    • Conflict Minerals Compliance
    • Quality Assurance
    • Environmental Efforts
    • Site Policy
  • FAQ
  • Contact Us
  • menu

Impact of film structure on damage to low-k SiOCH film during plasma exposure

Research Article Posted on 2015年8月12日2015年9月30日

Impact of film structure on damage to low-k SiOCH film during plasma exposure, Shigeo Yasuhara et al 2009 J. Phys. D: Appl. Phys. 42 235201

Library Archive

  • Library
  • Column
  • Domestic Conference
  • International Conference
  • Subsidy
  • Research Article
  • Tips
Contact FAQ Download Column

Company Profile

  • Company Profile
  • Message from the President
  • Management Philosophy
  • History
  • Access

Products

  • JAC’s Technologies
  • The field/areas in which JAC’s precursors are used.
  • Precursors
  • Film Deposition Service
  • Stainless Steel Canister
  • Consulting service
  • Custom Services (Entrusted Business)
  • Original Technology Development （R&D）
  • Feature of JAC’s Canister

Photo Gallery

  • Photo Gallery
  • Photo Gallery (Personal)

CSR Activities

  • CSR activities
  • Conflict Minerals Compliance
  • Quality Assurance
  • Environmental Efforts
  • Site Policy
  • Contact Us
  • FAQ
  • Library
    • Column
    • Domestic Conference
    • International Conference
    • Subsidy
    • Research Article
    • Tips
  • News
© Japan Advanced Chemicals