FAQ

Atomic Layer Deposition (ALD) is a thin film deposition method in which a film is grown on a substrate by exposing its surface to precursors.

1) One precursor has adsorbed to the surface.
2) Excess of molecules is removed.
3) Then, use another precursor to create new layer on the surface, and the excess will be removed.
These processes are repeated until desired thickness is obtained.

【Advantage of ALD】

• Excellent film control in microscopic area such as nanometers.
• Excellent uniformity, and excellent step coverage characteristics.
• Films without pinhole.
• Low deposition temperature.

ALD process has been applied for various fields, including semiconductor, compound semiconductor, MEMS/NEM, optical thin film, laser thin film, coating, corrosion prevention, renewable energy such as solar cell etc., medical device, biomaterial, moisture protection barrier, coating of accessory, over-coating for glass etc.

CVD (chemical vapor deposition) is one of the main techniques of thin film deposition method, and is widely used in various applications.
In the CVD process, volatile metal-organic compounds are decomposed by heat or plasma, and deposit film on the substrate.
With interaction between the compound and substrate surface, good coverage films can be obtained.
Precursors for ALD can be used for CVD too.

We have huge number of precursor list, and will select and propose the precursors most suitable for the customer’s needs.
If our current product portfolio can’t satisfy customer’s needs, we will try to custom synthesis of new precursors.
Please consult us at any time.

Based on your request (capacity, how to use, precursor etc.), our expert engineer will design the canister for you.
We have extensive knowledge and experience of precursors, so we can offer the canister best suited for your process.

Based on your request (capacity, how to use, precursor etc.), our expert engineer will design the canister for you.
We have extensive knowledge and experience of precursors, so we can offer the canister best suited for your process.

Based on long experience and extensive knowledge in semiconductor industry, we will support customer’s new business.

(For example)

• To provide appropriate precursor and film deposition service.
• To support marketing and sales based on detailed research information.
• To establish partnership in early development stage according to customer’s development theme.
• To support overseas expansion by proposing useful information including manufacturing, transportation, export and import, overseas location etc.

We can support your business in a wide range.
Please consult us at any time.

JAC’s precursors are used in various processes, such as surface modification of metals, glasses, plastics, and used for making its process in lower temperature, reducing film thickness, improve the adherence and uniformity etc.

We can synthesis “several grams” to “several kilo grams” as trial manufacturing as requested.

We have film deposition systems (PECVD, ALD) in our laboratory.
We prepared necessary and sufficient environment in which you can try film deposition test using new precursors, and can determine optimum precursor by screening, and can evaluate new process freely, with necessary assistance by our expert staff.
(Wafer size: chip size to 2 inch size stage)

Further, you can obtain chemical property information of the precursor (including thermal stability, decomposition temperature, vapor pressure etc.), using actual the precursors and actual systems.

• You want to check the film characteristics and deposition condition as a trial?
• You want to find out appropriate system design, required modification, film deposition conditions etc. before establish new project?

We can meet such request.
Please contact us at any time.

You can use our laboratory on a daily basis. (minimum: 1 day)
Please contact us for more information.

Our “Hot wall type CVD/ALD system” has very simple structure.
It is capable to use low vapor pressure precursors, which cannot be used in conventional system.
Please let us know if you are interested.

【Continuous Level Sensor】

It can monitor remaining precursor level in the canister on a real-time basis using ultrasonic.
Continuous level sensors have been adopted in many CVD/ALD process for semiconductor, LCD panels, solar cells etc.
Further, it can be used in various industries in which chemical products are used.

【Point Level Sensor】

It can judge the presence or absence of the liquid at the designated level using ultrasonic.
Point level sensors have been adopted in many CVD/ALD process for semiconductor, LCD panels, solar cells etc.
Further, it can be used in various industries in which chemical products are used.