We would like to inform you that our office will be closed temporarily for the Year End and New Year holidays from December 29th, 2017 until January 4th, 2018. Please be advised that all e-mails or contacts made during this period will be replied starting January 5th, 2018. We apologize for any inconveniences, and appreciate your kind understanding in advance. Wishing you every happiness this holiday season and throughout the coming year.
The AVS 17th International Conference on Atomic Layer Deposition (ALD 2017) featuring the 4th International Atomic Layer Etching Workshop (ALE 2017) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. JAC will set up the display booth at ALD2017. (Booth No, 6) Please come and visit our booth. We look forward to seeing you at ALD 2017, next July. ALD 2017 (17th International Conference on Atomic Layer Deposition) July 15-18, 2017 Sheraton Denver Downtown Hotel (Denver, Colorado) For more information, please click here.
JAC’s recent study was published in “ACS Omega”. [ACS Omega 2 1523 (2017)]
Our offices will be closed due to year-end & new year’s holiday between December 29, 2016 – January 4, 2017. We will resume JAC’s normal business from January 5th, 2017. Your requests or questions during the holidays will be accepted on the first day after the holidays.
JAC will be attending ALD 2016 conference (Atomic Layer Deposition 2016) from July 24 to July 27 in Dublin, Ireland. Please come visit our table. ■ Place: Convention Center Dublin ■ Date: 2016/7/24 – 2016/7/27 ■ City, Country: Dublin, Ireland ■ JAC’ Table: Tabletop Exhibit (#3) ■ Event Information: http://ald2016.com/
Japan Advanced Chemicals’s homepage has been redesigned.