平成23年度戦略的基盤技術高度化支援事業 テーマ： 次世代パワーデバイス向け革新的手法を用いた成膜技術の開発
Category Archives: お役立ちライブラリ
平成21年度ものづくり中小企業製品開発等支援補助金
平成21年度ものづくり中小企業製品開発等支援補助金（試作開発等支援事業） テーマ： 液体薬品を極めて清浄なまま半導体製造装置等へ供給するための装置の開発
中小企業・ベンチャー挑戦支援事業のうち事業化支援事業
中小企業・ベンチャー挑戦支援事業のうち事業化支援事業 テーマ 「超高純度酸化シリコンの低温成長用新規シリコン材料の事業化」
The influences of filament temperature on the structure of boron nitride films and its tribological characterization for microforming die application
The influences of filament temperature on the structure of boron nitride films and its tribological characteri …Read More >>
Super-low-k SiOCH film (k = 1.9) with extremely high water resistance and thermal stability formed by neutral-beam-enhanced CVD
Super-low-k SiOCH film (k = 1.9) with extremely high water resistance and thermal stability formed by neutral- …Read More >>
Impact of film structure on damage to low-k SiOCH film during plasma exposure
Impact of film structure on damage to low-k SiOCH film during plasma exposure, Shigeo Yasuhara et al 2009 J. P …Read More >>
Ultimate-low-k SiOCH film (k=3D1.3) with sufficient modulus (>5 GPa) and ultra-high thermal stability formed by low-temperature pulse-time-modulated neutral-beam-enhanced CVD
Ultimate-low-k SiOCH film (k=3D1.3) with sufficient modulus (>5 GPa) and ultra-high thermal stability forme …Read More >>
Structure-Designable Formation-Method of Super Low-k SiOC Film (k=2.2) by Neutral-Beam-Enhanced-CVD
Structure-Designable Formation-Method of Super Low-k SiOC Film (k=2.2) by Neutral-Beam-Enhanced-CVD, Interconn …Read More >>
Tribological characterization of boron nitride films against
Tribological characterization of boron nitride films against, 11th International Conference on Technology of P …Read More >>
Fabrication and Investigation of new amino-silane precursor(BEMAS) for low temperature deposition of SiO and SiN
Fabrication and Investigation of new amino-silane precursor(BEMAS) for low temperature deposition of SiO and S …Read More >>