Super-low-k SiOCH film (k = 1.9) with extremely high water resistance and thermal stability formed by neutral-beam-enhanced CVD

論文発表投稿日: 2015年8月12日2015年9月30日

Super-low-k SiOCH film (k = 1.9) with extremely high water resistance and thermal stability formed by neutral-beam-enhanced CVD, Shigeo Yasuhara et al 2010 J. Phys. D: Appl. Phys. 43 065203