Film Deposition Service

Thin film deposition techniques have been developed with semiconductor device manufacturing techniques, and are applied to very many fields today.

Deposition technique of the thin films with new function on the existing objects (such as corrosion-resistant coating on precision parts, wear-resistant coating on automobile parts and cutting tools, gas-barrier coating on food packaging resin etc.) generates additional values.

Application range of thin film deposition technique will continue to increase in the future.

JAC are providing consistent service such as:
- Selection (synthesis/purification) of appropriate precursor to meet customer’s requests.
- Film deposition test.
- Provide immediate feedback.
- Screening of precursors.
- Development of basic deposition process.

Based on the customer’s needs, we will offer the appropriate precursors and processes, and will perform film deposition test.

Do you worry about following situations?

We can solve your problems.

In order to provide solution to such situations, we prepared necessary and sufficient environment in which you can try film deposition test using new precursors, and can determine optimum precursor by screening, and can evaluate new process freely, with necessary assistance by our expert staff.

Doing the preliminary film deposition test and precursor screening in our laboratory, you may be able to reduce the cost and shorten the development period drastically.

In response to requests from customers, we can modify our system, and change the settings flexibly such as:
- Gas line
- Heating method
- Plasma treatment
- Providing bias in wafer …etc.
Please feel free to consult us.
We are fully prepared to help you at any time.

Items that can be studied in film deposition test (example)

【Precursor】

Precursor structure, bottle shape, vaporization temperature, gas flow rate, carrier gas flow rate, precursor stability etc.

【Gas】

Appropriate oxidizing gas, appropriate nitriding gas, its flow rate etc.

【System】

Film deposition temperature, chamber pressure, film deposition process, wafer dependency, embedding properties etc.

You can obtain chemical property information of the precursor (including thermal stability, decomposition temperature, vapor pressure etc.), and also can embody the optimum system specification clearly based on the result of actual film deposition tests using the precursors.

UHV type CVD, ALD system	High-temperature CVD・ALD system	Hot wall CVD, ALD system
		Simple evaluation system and can be heated up to 650 deg-C. The precursors which have lower vapor pressure can be handled in this system.
UHV type CVD/ALD system for evaluation of precursors/processes. It has 12 gas lines, and extra line can be installed upon request.	High-temperature CVD/ALD system for evaluation of precursors/processes. It can be heated up to 1,000 deg-C.

UHV　type CVD・ALD system

High-temperature CVD・ALD system

Hot wall CVD, ALD system