Precursors

The wide range of precursors is our business foundation.

We are providing wide range of precursors which are used in ALD (Atomic Layer Deposition) / CVD (Chemical Vapor Deposition), Si/compound semiconductor, coating and other fields.

Based on many years of experience and results in chemical industry, we offer appropriate precursor best suited to your requirements.

If our current product portfolio does not meet customer’s requirements, we will be pleased to start custom synthesis of new chemicals.

When you are intending to improve your film deposition process, and/or when you are considering deposition with new precursors, selecting an appropriate precursor is the important factor.

The precursors listed below are only a few of our product portfolio.
We can propose/supply most suitable product for your system and conditions etc.

If you have any question, request and etc., no matter how small it is, please do not hesitate to contact us.

*Some of chemicals such as manufacturing is prohibited by the low, highly toxic, radioactive products, its’ raw material is unobtainable can’t be handled.

Periodic table

Click the table (element) to go to related precursors.
元素                 
HHe
LIBeBCNOFNe
NaMGAlSiPSCLAR
KCaScTiVCrMnFeCoNiCuZnGaGeAsSEBRKR
RbSrYZrNbMoTcRuRhPdAgCdInSnSbTeIXe
CsBaLaHfTaWReOsIrPtAuHgTlPbBiPoAtRn
FrRaAcRfDbSgBhHsMtRgDsUubUutUuqUupUuhUusUuo
LaCePrNdPmSmEuGdTbDyHoErTmYbLu
AcThPaUNpPuAmCmBkCfEsFmMdNoLr

You can search the precursors by element, chemical name, molecular formula, CAS number etc.

FormulaAbbrev.Product NameCAS No.Product No.MSDSElement
Al(CH3)3TMATrimethylaluminum75-24-1P0014Al
Al(C11H19O2)3Al(DPM)3トリス (2,2,6,6–テトラメチル -3,5 3,5-ヘプタンジオン酸)アルミニウム14319-08-5P0291MSDSAl
Al(C2H5)3TEAトリエチルアルミニウム97-93-8P0437MSDSAl
(CH3)2(CH3O)SiOSi(OCH3)(CH3)2DMOTMDS1,3-ジメトキシ-1,1,3,3-テトラメチルジシロキサン18187-24-1P0366MSDSSi
[Si(CH3)2O]4OMCTSオクタメチルシクロテトラシロキサン556-67-2P0023MSDSSi